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Mentor Graphics Calibre MPCpro IC制造
  • Mentor Graphics Calibre MPCpro IC制造

Mentor Graphics Calibre MPCpro IC制造

更新时间:2023-02-21 21:32:26

明导国际(MentorGraphics)Mentor是全球著名的EDA工具厂商,提供芯片与系统开发所需的各种设计、仿真与制造工具,与Synopsys和Cadence并称全球三大EDA公司。其2015年营收在12亿美元左右,营运利润约为

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Calibre MPCpro
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Calibre MPCpro

Until the 32 nm node, distortions involved in making the masks using 193 nm lithography were small and had little impact since mask features are four times larger than the actual features on a die. Traditional OPC has mainly addressed the wafer image transfer and only included mask making effects as a part of the overall OPC model. Accurate mask making for 32/22 nm now requires dedicated optical proximity correction for the mask making step. Instead of lumping mask errors into the overall OPC model, decoupling mask correction from the wafer correction simplifies the correction process and improves the quality of the overall result.

The Calibre Mask Process Correction solution applies Mentor’s model-based OPC technology with optimizations specifically developed for e-beam mask writers. New correction and modeling capabilities, including both density-based and Variable Etch Bias modeling, improve mask CD linearity and uniformity for advanced nodes. The solution also includes tools for mask model building and customization integrated with Calibre Workbench. To round out Mentor’s complete mask synthesis solution, the Calibre platform includes tools for mask rule-checking and sign-off, fracturing, and data conversion for the leading e-beam mask writing equipment.

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